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18 Nov 2009, 3:38 pm by blaisemouttet
http://www.freepatentsonline.com/7618250.htmlThis patent from ASML Netherlands B.V. teaches diffraction gratings used to align nanoimprintlithography and enable multilayer patterning. [read post]
18 Feb 2009, 2:36 pm
This patent from ASML Netherlands B.V. teaches using a nanoparticle-based top layer to avoid internal reflection in immersion lithography systems. [read post]
29 May 2012, 10:34 am by Andrew Ramonas
Those filings followed Dewey's lobbying termination reports for Aegis Insurance Services Inc. on Wednesday and ASML Netherlands B.V. and the Semiconductor Industry Association on May 15. [read post]